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Detalhes da Produção
Tipo | Artigo Publicado |
Grupo | Produção Bibliográfica |
Descrição | Mello, Bernardo ; Chaves, Alaor ; Oliveira, Fernando. Discrete atomistic model to simulate etching of a crystalline solid. Physical Review E. (Cessou em 2000. Cont. 1539-3755 Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics), v. 63, p. 041113-, 2001. |
Autor | Bernardo de Assunção Mello |
Ano | 2001 |
Informações Complementares
Ano do artigo | 2001 |
Descricão e Informacões Adicionais | A discrete atomistic solid-on-solid model is proposed to describe dissolution of a crystalline solid by a liquid. The model is based on the simple assumption that the probability per unit time of a unit cell being removed is proportional to its exposed area. Numerical simulations in one dimension demonstrate that the model has very good scaling properties. After removal of only about 102 monolayers, independently of the substrate size, the etched surface shows almost time-independent short-range correlations and the receding surface presents the Family-Vicsek scaling behavior. The scaling parameters = 0.491 0.002 and = 0.330 0.001 indicate that the system belongs to the Kardar-Parisi-Zhang universality class. The imposition of periodic boundary conditions on the simulations reduces the effective system size by a factor of 0.68 without changing the exponents and . Surprisingly, the periodic condition changes drastically the statistics of the surface height fluctuations and the short-range correlations. Without periodic conditions, that statistics is, up to 3 standard deviations, an asymmetric Lévy distribution with = 1.82 0.01, and outside this region the statistics is Gaussian. With periodic conditions, that statistics is Gaussian, except for large negative fluctuations. |
Divulgacão Científica | NAO |
DOI | 10.1103/PhysRevE.63.041113 |
Fascículo | 4 |
Idioma | Inglês |
ISSN | 1063651X |
local de publicacao | Estados Unidos |
Meio de Divulgação | MEIO_DIGITAL |
Natureza | COMPLETO |
Página Inicial | 041113 |
Relevância | SIM |
Série | 4 |
Título do Artigo | Discrete atomistic model to simulate etching of a crystalline solid |
Título do Períodico ou Revista | Physical Review E. (Cessou em 2000. Cont. 1539-3755 Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics) |
Volume | 63 |